Advanced AFM nanomachining: high aspect repairs

Maria J. Cadena; Tod Robinson; Marty Klos

doi:10.1117/12.2601389

23 August 2021 Advanced AFM nanomachining: high aspect repairs

Maria J. Cadena, Tod Robinson, Marty Klos

Proceedings Volume 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology; 1190803 (2021) https://doi.org/10.1117/12.2601389
Event: Photomask Japan 2021, 2021, Online Only

Abstract

Progress is aggressively being made to advance nanomachining photomask repair technology to the next level of performance. This next level would allow for the dimensional modification of surfaces using diamond AFM tips (NanoBits) with nominal aspect ratios (AR’s) greater than or equal to 1.3 (including 1.8) in the smallest features in production. Prior work along these lines will be presented with new results from a novel process with comparison to established nanomachining processes. These results will evaluate test repairs on the most advanced photomasks currently in production including OMOG and EUV.

Citation Download Citation

Maria J. Cadena, Tod Robinson, and Marty Klos "Advanced AFM nanomachining: high aspect repairs", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190803 (23 August 2021); https://doi.org/10.1117/12.2601389

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