Since 2019, EUV lithography has started to be used for the mass production of 7-nm-node-logic devices. However, many significant issues on EUV lithography still remain in the fabrication of future devices. The technical issues are the development technologies of resist, mask, and EUV light source. Therefore, many significant fundamental researches have been carried out at our facility. Here the EUV mask technologies is highlighted. It is described the fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility, which is related with EUV mask technologies.
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