Paper
23 August 2021 Automatic design of the build-in lens mask for three-dimensional photo lithography
Tomoaki Osumi, Masaru Sasago, Masaaki Yasuda, Yoshihiko Hirai
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Abstract
Automatic design systems of the Built-in Lens Mask (BILM) for three-dimensional photo lithography will be presented based on conventional feedback control procedure. The 3Dstructure, which is imaged by BILM sometimes missing the pattern due to optical interferences. By optimization of the BILM mask, the optical image becomes fine, smooth and unity.
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Tomoaki Osumi, Masaru Sasago, Masaaki Yasuda, and Yoshihiko Hirai "Automatic design of the build-in lens mask for three-dimensional photo lithography", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190809 (23 August 2021); https://doi.org/10.1117/12.2598156
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