Tone reversal patterning for advanced technology nodes

F. Schleicher; J. Bekaert; A. Thiam; S. Decoster; R. Blanc; F. Lazzarino; J. Garcia Santaclara; G. Rispens; M. Maslow

doi:10.1117/12.2610941

25 May 2022 Tone reversal patterning for advanced technology nodes

F. Schleicher, J. Bekaert, A. Thiam, S. Decoster, R. Blanc, F. Lazzarino, J. Garcia Santaclara, G. Rispens, M. Maslow

Proceedings Volume 12056, Advanced Etch Technology and Process Integration for Nanopatterning XI; 1205605 (2022) https://doi.org/10.1117/12.2610941
Event: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Abstract

As technology nodes continue to scale down, maintaining roughness and defectivity during the pattern transfer becomes more challenging. For the smallest features, Metal-Organic Resists (MOR) are preferred due to their better selectivity than Chemically Amplified Resists (CAR). However, MORs are usually negative tone resists. Primarily based on defectivity reasons, dark field Extreme Ultraviolet (EUV) masks are strongly preferred over light field EUV masks. Therefore, the MOR resist is more suited for pillar patterning than hole patterning. The purpose of this paper is to show that exposing pillars with MOR and converting them into holes can yield better roughness and defectivity than patterning holes with CAR directly. A similar comparison is done for the tone reversal of lines and spaces. It is shown that the Local Critical Dimension Uniformity (LCDU) of holes and the Line Edge Roughness (LER) of lines/spaces are well conserved throughout the tone inversion process.

Conference Presentation

Citation Download Citation

F. Schleicher, J. Bekaert, A. Thiam, S. Decoster, R. Blanc, F. Lazzarino, J. Garcia Santaclara, G. Rispens, and M. Maslow "Tone reversal patterning for advanced technology nodes", Proc. SPIE 12056, Advanced Etch Technology and Process Integration for Nanopatterning XI, 1205605 (25 May 2022); https://doi.org/10.1117/12.2610941

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available