Effect of VLSI fabrication errors on kinoform efficiency

Michael W. Farn; Joseph W. Goodman

doi:10.1117/12.17929

1 May 1990 Effect of VLSI fabrication errors on kinoform efficiency

Michael W. Farn, Joseph W. Goodman

Proceedings Volume 1211, Computer and Optically Formed Holographic Optics; (1990) https://doi.org/10.1117/12.17929
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

Computer simulations are used to investigate the effects of vlsi fabrication errors on the efficiency of kinoforms. Fabrication and error models are described. Simulation results are presented and discussed.

Citation Download Citation

Michael W. Farn and Joseph W. Goodman "Effect of VLSI fabrication errors on kinoform efficiency", Proc. SPIE 1211, Computer and Optically Formed Holographic Optics, (1 May 1990); https://doi.org/10.1117/12.17929

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