Paper
30 January 2022 Gate-controlled sensing of ammonia by single-layer MoS2 field-effect transistor
N. S. Struchkov, N. P. Nekrasov, A. V. Emelianov, F. T. Tuyakova, I. I. Bobrinetskiy
Author Affiliations +
Proceedings Volume 12157, International Conference on Micro- and Nano-Electronics 2021; 121570Q (2022) https://doi.org/10.1117/12.2623293
Event: International Conference on Micro- and Nano-Electronics 2021, 2021, Zvenigorod, Russian Federation
Abstract
Two-dimensional transition metal dichalcogenides (TMDC) and MoS2 in particular are promising materials as sensitive layers for gas sensing due to room operation temperature, high sensitivity, low dimensions, vast methods of selectivity alteration, etc. MoS2 response to toxic gases exposure depends on applied electric field that expands capabilities of resistive detection techniques, therefore, requires in-depth study. We fabricated a back-gated MoS2 based field-effect transistor (MoS2-FET) with standard photolithography technique on Si/SiO2 substrate. AFM microscopy confirmed the single layer nature of MoS2 flakes by cross-section featuring a thickness of 0.7 nm. Raman spectroscopy revealed A1g and E1 2g modes position at 403.5 cm-1 and 382 cm-1 respectively. The mobility in the absence of passivation was about 10-1 cm2 V−1s−1. MoS2-FET exhibits room-temperature NH3 sensing with resistive response to 200 ppm exposure of about ~60%, signal-to-noise ratio about 8, and response/recovery time about 100 s.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. S. Struchkov, N. P. Nekrasov, A. V. Emelianov, F. T. Tuyakova, and I. I. Bobrinetskiy "Gate-controlled sensing of ammonia by single-layer MoS2 field-effect transistor", Proc. SPIE 12157, International Conference on Micro- and Nano-Electronics 2021, 121570Q (30 January 2022); https://doi.org/10.1117/12.2623293
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KEYWORDS
Molybdenum

Atomic force microscopy

Chemical vapor deposition

Raman spectroscopy

Transistors

Annealing

Optical lithography

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