AFM study of the MoS2 thin films deposited by magnetron sputtering growth initial stage

A. I. Belikov; K. Z. Phyo; M. M. Guk

doi:10.1117/12.2622386

30 January 2022 AFM study of the MoS₂ thin films deposited by magnetron sputtering growth initial stage

A. I. Belikov, K. Z. Phyo, M. M. Guk

Proceedings Volume 12157, International Conference on Micro- and Nano-Electronics 2021; 121571G (2022) https://doi.org/10.1117/12.2622386
Event: International Conference on Micro- and Nano-Electronics 2021, 2021, Zvenigorod, Russian Federation

Abstract

Molybdenum disulfide (MoS₂) thin films with a thickness of about 3.5 nm to 11.5 nm on Si (111) and sapphire (0001) substrates were prepared by the stoichiometric MoS₂ target (99.9% purity) magnetron sputtering. The structure formation features of the thin films were studied by preparing samples under the same deposition conditions and different deposition times 10, 20, and 30 s. Atomic force microscopy (AFM) was used to study the thin film samples' morphological features and revealed various mechanisms of films structure formation on Si and sapphire substrates. For the thin films samples, the reflection spectra obtained and the values of the optical band gap were determined, which ranged from 1.73 to 1.69 eV.

Citation Download Citation

A. I. Belikov, K. Z. Phyo, and M. M. Guk "AFM study of the MoS₂ thin films deposited by magnetron sputtering growth initial stage", Proc. SPIE 12157, International Conference on Micro- and Nano-Electronics 2021, 121571G (30 January 2022); https://doi.org/10.1117/12.2622386

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