An optimized data prep flow for curvilinear masks

John Valadez; Yu-Po Tang; Mikhayil Mkrtchyan

doi:10.1117/12.2640638

15 September 2022 An optimized data prep flow for curvilinear masks

John Valadez, Yu-Po Tang, Mikhayil Mkrtchyan

Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 1232509 (2022) https://doi.org/10.1117/12.2640638
Event: Photomask Japan 2022, 2022, Online Only

Abstract

With the emergence of complex ILT (Inverse Lithography Technology) and multi-beam mask writers, comes the rise of curvilinear masks. Curvy shapes or all angle piecewise linear polygons provide optimal results for chip makers as it provides larger process windows. For mask manufacturers, the objective remains the same; writing a mask that meets the chip makers’ specifications. However, if the curvilinear shapes need biasing to correct for process effects, then individual edge adjustment is not an appropriate solution as the segment lengths are extremely small. This approach would require far more computational resources then it would for the typical Manhattanized layout. Thus, as the industry transitions from traditional layouts with rectilinear polygons to full curvy, or even a hybrid mix, there must be an optimized path available that enables a more ‘holistic’ approach to correction for all types. One that can balance ease-of-use, data complexity, and robust enough to meet strict tolerances and EPE specifications. In this paper, we will outline a fully supported MDP flow for curvilinear masks. The functionality is provided by the Proteus Curvilinear OPC engine and fully supports ILT and EUV layers as well as other curvilinear masks. We will provide an overview of the data path, from correction to multi-beam writer format. We will also describe the controls necessary to achieve optimal quality and share both data metrics and performance results.

Citation Download Citation

John Valadez, Yu-Po Tang, and Mikhayil Mkrtchyan "An optimized data prep flow for curvilinear masks", Proc. SPIE 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1232509 (15 September 2022); https://doi.org/10.1117/12.2640638

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KEYWORDS

Photomasks

Control systems

Databases

Tolerancing

Extreme ultraviolet

Optical proximity correction

Data modeling

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