We develop a special type of imaging multicolor ellipsometer to map big area thin layers or multilayers on rigid or flexible substrates. In thin film production, layer thicknesses, micro-structure, composition, layer optical properties, and their uniformity are important data. Scanning ellipsometers with conventional collimated beams measure with high precision but the mapping time can be very long. We developed expanded beam ellipsometry to map rapidly the polarization state changes after reflection from bigger surfaces [Horváth, Z Gy; Juhász, G; Fried, M; Major, C; Petrik, P, Imaging optical inspection device with a pinhole camera, patent WO2008142468A1]. Ellipsometric data of large areas can be collected a couple of 10 times faster compared to the “traditional” scanning methods. The aim of this work is to make prototypes for this optical mapping using only cheap parts: tablet, monitor, big screen TV and a pinhole camera using a CMOS Sensor with Integrated 4-Directional Wire Grid Polarizer Array (Sony's IMX250MYR CMOS) as detector. We present the first results of mapping the thickness on different samples.
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