Binary solution for optimization of pixelated EUV source using constrained mathematical programming

Michael Yeung; Eytan Barouch

doi:10.1117/12.2659099

28 April 2023 Binary solution for optimization of pixelated EUV source using constrained mathematical programming

Michael Yeung, Eytan Barouch

Proceedings Volume 12494, Optical and EUV Nanolithography XXXVI; 124940K (2023) https://doi.org/10.1117/12.2659099
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Abstract

In this paper, we present a new approach to EUV source optimization which automatically generates a binary solution for the intensities of almost all the pixels. The benefit of such a binary solution is that the source power is distributed evenly over all the illuminated pixels, thus avoiding large intensity spikes which can lead to accelerated, radiation-induced degradation of certain parts of the imaging system.

Citation Download Citation

Michael Yeung and Eytan Barouch "Binary solution for optimization of pixelated EUV source using constrained mathematical programming", Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI, 124940K (28 April 2023); https://doi.org/10.1117/12.2659099

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