A study of 3nm CFET middle-of-the-line contact layer OCD measurement sensitivity

Xianhe Liu; Qiang Wu; Qi Wang; Yanli Li

doi:10.1117/12.2658174

27 April 2023 A study of 3nm CFET middle-of-the-line contact layer OCD measurement sensitivity

Xianhe Liu, Qiang Wu, Qi Wang, Yanli Li

Proceedings Volume 12496, Metrology, Inspection, and Process Control XXXVII; 124962Z (2023) https://doi.org/10.1117/12.2658174
Event: SPIE Advanced Lithography + Patterning, 2023, San Jose, California, United States

Conference Poster

Abstract

In advanced integrated circuit manufacturing technology, the introduction of nanosheet, forksheet, and Complementary Field Effect Transistor (CFET) architectures has created very complicated and dense vertical structures with dimensions as small as several nanometers and with many metallic layers which are not transparent to most optical wavelengths, posing a serious challenge to the metrology. We have provided a scatterometry study on a test pattern design based on the 3 nm logic design rules. Through a simulation study on typical dimensions, we have investigated various linewidths and contact depth with an algorithm based on the Rigorous Coupled Wave Analysis (RCWA).

Citation Download Citation

Xianhe Liu, Qiang Wu, Qi Wang, and Yanli Li "A study of 3nm CFET middle-of-the-line contact layer OCD measurement sensitivity", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124962Z (27 April 2023); https://doi.org/10.1117/12.2658174

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