We describe two studies that examine how the enhancement and suppression of the solubility of a 193-nm positive-tone photoresist can be manipulated using crosslinking, thermal-activation and variable-temperature bakes. In our first study, we describe the development of a thin, polymeric film that can transition through three solubility regimes as a response to increasing bake temperatures: (1) low temperature, developer insoluble; (2) medium temperature, developer soluble; (3) high temperature, developer insoluble.
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