Research of glass marking process based on the 532 nm wavelength laser

Yuanchao Du; Yuan Chen; Lingling Zhang

doi:10.1117/12.2655996

16 December 2022 Research of glass marking process based on the 532 nm wavelength laser

Yuanchao Du, Yuan Chen, Lingling Zhang

Proceedings Volume 12501, Seventeenth National Conference on Laser Technology and Optoelectronics; 125010K (2022) https://doi.org/10.1117/12.2655996
Event: Seventeenth National Conference on Laser Technology and Optoelectronics, 2022, Shanghai, China

Abstract

High borosilicate glass has the advantages of high light transmittance, good mechanical performance, chemical stability and thermal stability. It is widely used in daily use, chemistry, architecture, electronics, instruments and other fields. There is a large number of identification requirements in the application. In this paper, based on the 532nm wavelength laser, the marking process of high borosilicate glass is studied. The influence rule and mechanism of duty ratio, repetition frequency, marking speed and defocus amount on the marking effect are explored by single factor control variable method. The research results show that the four process parameters have an important impact on the integrity of the identification profile. Through the optimization of the process parameters, the process window of 532nm wavelength laser identification of high borosilicate glass is obtained, which realizes the good identification effect of the identification morphology and provides a reference for the green light identification of high borosilicate glass.

Citation Download Citation

Yuanchao Du, Yuan Chen, and Lingling Zhang "Research of glass marking process based on the 532 nm wavelength laser", Proc. SPIE 12501, Seventeenth National Conference on Laser Technology and Optoelectronics, 125010K (16 December 2022); https://doi.org/10.1117/12.2655996

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KEYWORDS

Laser marking

Glasses

Repetition frequency

Borosilicate glass

Laser cutting

Pulsed laser operation

Laser applications

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