Dielectric filter optimization by simulated thermal annealing: a simulated zone-melting approach

Rudolph H. Morf; Rino E. Kunz

doi:10.1117/12.20359

1 August 1990 Dielectric filter optimization by simulated thermal annealing: a simulated zone-melting approach

Rudolph H. Morf, Rino E. Kunz

Proceedings Volume 1270, Optical Thin Films and Applications; (1990) https://doi.org/10.1117/12.20359
Event: The International Congress on Optical Science and Engineering, 1990, The Hague, Netherlands

Abstract

A method for designing thinfilm optical filters based on simulated zone melting techniques is outlined. In contrast to conventional methods, but like all methods based on the simulated annealing ideas, it does not require a good starting design and helps to find good solutions separated by barriers in the quality function. Recently, there has been a lot of interest in mosaic filter arrays, which are required for colour cameras based on a single charge coupled-device image sensor. As a result of the trend to smaller and higher resolution sensors, the pixel size becomes smaller and therefore the thickness of such filters significantly affects the cross talk from pixel to pixel. Such constraints can be incorporated in the merit function by penalizing too thick dielectric layers. It turns out that the thickness of typical colour separation filters can be kept significantly below 2gm, using as dielectrics T102 and S102. Examples of yellow, green and cyan filters, as well as a spectrally Gaussian transmission filter are presented.

Citation Download Citation

Rudolph H. Morf and Rino E. Kunz "Dielectric filter optimization by simulated thermal annealing: a simulated zone-melting approach", Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); https://doi.org/10.1117/12.20359

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