Open Access Paper
29 November 2023 Front Matter: Volume 12750
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 12750, including the Title Page, Copyright information, Table of Contents, and Conference Committee information.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in International Conference on Extreme Ultraviolet Lithography 2023, edited by Patrick P. Naulleau, Paolo A. Gargini, Toshiro Itani, Kurt G. Ronse, Proc. of SPIE 12750, Seven-digit Article CID Number (DD/MM/YYYY); (DOI URL).

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510667488

ISBN: 9781510667495 (electronic)

Published by

SPIE

P.O. Box 10, Bellingham, Washington 98227-0010 USA

Telephone +1 360 676 3290 (Pacific Time)

SPIE.org

Copyright © 2023 Society of Photo-Optical Instrumentation Engineers (SPIE).

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of fees. To obtain permission to use and share articles in this volume, visit Copyright Clearance Center at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher.

Printed in the United States of America by Curran Associates, Inc., under license from SPIE.

Publication of record for individual papers is online in the SPIE Digital Library.

00001_PSISDG12750_1275001_page_2_1.jpg

Paper Numbering: A unique citation identifier (CID) number is assigned to each article in the Proceedings of SPIE at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Conference Committee

Conference Chairs

  • Patrick P. Naulleau, Lawrence Berkeley National Laboratory (United States)

  • Paolo A. Gargini, Stanford (United States)

  • Toshiro Itani, Osaka University (Japan)

  • Kurt G. Ronse, imec (Belgium)

Conference Co-chair

  • Eric M. Panning, Lavorro Inc. (United States)

Conference Program Committee

  • Winfried Kaiser, Carl Zeiss SMT GmbH (Germany)

  • Eric Hendrickx, imec (Belgium)

  • Takahiro Kozawa, Osaka University (Japan)

  • Jinho Ahn, Hanyang University (Korea, Republic of)

  • Herman H. P. Th. Bekman, TNO (Netherlands)

  • Jennifer Church, IBM Thomas J. Watson Research Center (United States)

  • Huixiong Dai, Applied Materials, Inc. (United States)

  • Anuja De Silva, Lam Research Corporation (United States)

  • Sandip Halder, SCREEN SPE Germany GmbH (Germany)

  • Tetsuo Harada, University of Hyogo (Japan)

  • Rik Jonckheere, imec (Belgium)

  • Kunihiko Kasama, Ushio Inc. (Japan)

  • Chawon Koh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

  • Bryan S. Kasprowicz, HOYA Corporation (United States)

  • Daisuke Kawana, Tokyo Ohka Kogyo Co., Ltd. (Japan)

  • Marie E. Krysak, Intel Corporation (United States)

  • Ted Liang, Intel Corporation (United States)

  • Sang Hun Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

  • Chang-Moon Lim, SK Hynix, Inc. (Korea, Republic of)

  • John C. Lin, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan)

  • Iacopo Mochi, Paul Scherrer Institut (Switzerland)

  • Seiji Nagahara, Tokyo Electron Ltd. (Japan)

  • Shinji Okazaki, ALITECS Co., Ltd. (Japan)

  • Ray Shi, KLA Corporation (United States)

  • Akiyoshi Suzuki, Gigaphoton Inc. (Japan)

  • Thomas C. Stammler, Carl Zeiss SMT GmbH (Germany)

  • Hans Stiepan, Carl Zeiss SMT GmbH (Germany)

  • Mark A. van de Kerkhof, ASML Netherlands B.V. (Netherlands)

  • Jan van Schoot, ASML Netherlands B.V. (Netherlands)

  • Eelco van Setten, ASML Netherlands B.V. (Netherlands)

  • Satoshi Tanaka, KIOXIA Corporation (Japan)

  • Stefan Wurm, Atice LLC (United States)

  • Joerg Zimmermann, Carl Zeiss SMT GmbH (Germany)

© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 12750", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 1275001 (29 November 2023); https://doi.org/10.1117/12.3021566
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Extreme ultraviolet lithography

Signal processing

Stochastic processes

Error analysis

Pellicles

Photomasks

3D image processing

Back to Top