Use of advanced data modeling to introduce and extend mask tools serving mainstream application

Mohamed Ramadan; Christopher Progler; Michael Green; Henry Kamberian; Jinju Beineke

doi:10.1117/12.2688168

21 November 2023 Use of advanced data modeling to introduce and extend mask tools serving mainstream application

Mohamed Ramadan, Christopher Progler, Michael Green, Henry Kamberian, Jinju Beineke

Proceedings Volume 12751, Photomask Technology 2023; 127510I (2023) https://doi.org/10.1117/12.2688168
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Advances in technologies such as 5G, internet of things (IoT), automotive and medical devices, to name a few, have created a new demand for mature node IC devices. This, in turn, has accelerated the introduction of new mature node designs and raised the demand for photomasks serving these products. Manufacturing mature design node ICs and photomasks requires high volume, high yield, quick turn and price sensitive processes. For example, laser writers can be the preferred photomask patterning solution for those applications as they are fast and cost efficient compared to ebeam writers. In order to address the market and the expanding design variety (e.g., curvilinear shapes, AI generated designs, chiplets) of mature node applications, we have developed a suite of capabilities leveraging advanced data modeling that helps deliver efficient and reliable production of mature node photomasks. Examples include inter-tool and inter-site process matching to scale mature production and address tool end of life challenges. Adapting novel design styles to higher productivity, cost effective platforms such as laser writing is also an area of emphasis. We present various cases where our model driven data techniques have impacted mature node productivity and resiliency by addressing the increasing unit demand and design complexity. In addition, we highlight elements of characterization, model building and deployment within these mature node data solutions.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Mohamed Ramadan, Christopher Progler, Michael Green, Henry Kamberian, and Jinju Beineke "Use of advanced data modeling to introduce and extend mask tools serving mainstream application", Proc. SPIE 12751, Photomask Technology 2023, 127510I (21 November 2023); https://doi.org/10.1117/12.2688168

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