Curvilinear OPC mask synthesis flow

Yunqiang Zhang; Linghui Wu; Jian Rao; Yongdong Wang

doi:10.1117/12.2686921

21 November 2023 Curvilinear OPC mask synthesis flow

Yunqiang Zhang, Linghui Wu, Jian Rao, Yongdong Wang

Proceedings Volume 12751, Photomask Technology 2023; 127510T (2023) https://doi.org/10.1117/12.2686921
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Curvilinear OPC has been developed for improved process window, more freedom in mask constraint and better MRC enforcement. Combined Curve OPC with ILT can further improve mask synthesis flow. We demonstrate hybrid curve OPC/ILT flows for more flexible deployment. High NA OPC together with anamorphic MRC can be well handled in this platform. Curve OPC can be deployed in co-optimization flow like litho-etch OPC, process window aware OPC, etc. Correction of any angle layout is challenging. We present our OPC solutions in handle of any angle layout and demonstrate good correction results.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Yunqiang Zhang, Linghui Wu, Jian Rao, and Yongdong Wang "Curvilinear OPC mask synthesis flow", Proc. SPIE 12751, Photomask Technology 2023, 127510T (21 November 2023); https://doi.org/10.1117/12.2686921

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