Poster + Paper
21 November 2023 Research and optimization of electronic charge phenomena on CDSEM imaging of binary photomask
Jiaying Luo, Irene Shi, Brian Zheng, Yuming Gan, Zhuowei Zhang, Tony Ge, Eric Guo
Author Affiliations +
Conference Poster
Abstract
CD-SEM is widely used to determine photomask CD performance, SEM image accuracy is crucial for CD measurement. SEM image blurring caused by charging on a type of binary photomask is a major issue we encounter during manufacturing, not only the image form is not clear on Isolated Clear patterns, also obvious CD deviation is observed on Isolated Dark patterns. We investigate into this issue and search for methods to remove residual charge on photomask. We found that these residual charge cannot be removed by electrolyte solutions in cleaning process but will disappear after a few days in fabrication environment. Furthermore, we found these phenomena reappear after UV radiation in close distance or O2 plasma sputtering on the photomask. In this research, we prove that sputtering a mixture gases plasma can effectively eliminate this phenomenon without any negative impact on the binary photomask itself.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Jiaying Luo, Irene Shi, Brian Zheng, Yuming Gan, Zhuowei Zhang, Tony Ge, and Eric Guo "Research and optimization of electronic charge phenomena on CDSEM imaging of binary photomask", Proc. SPIE 12751, Photomask Technology 2023, 1275110 (21 November 2023); https://doi.org/10.1117/12.2684538
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KEYWORDS
Photomasks

Binary data

Plasma

Critical dimension metrology

Scanning electron microscopy

Ultraviolet radiation

Mixtures

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