Paper
20 December 2023 Progress toward a total solution for mask shop data input
Norm Austin, Mike Clary
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Abstract
Last night Steve Dunbrach and the panel discussed the problem of ever tightening specifications and equipment limits. Do the mask makers have their facilities and procedures optimized to push the equipment to the limits? Answers to these questions may make some opportunities apparent: 1. How close is your turn time to the equipment limits? Suppose that you are given one month advance warning on the design sign off date for a megabit chip at a remote site. How long would it take your shop to complete the first mask in the set? The typical answer is 3 to 5 days. 2. How many hours would that first completed mask take in one of the most advanced shops in the U.S.? The answer at AT&T is 8 hours. 3. How clean is your QA department during production? A typical answer is Class 1000. 4. How clean is the GW department in one of the most advanced shops in the U.S.? The answer at AT&T is Class 10.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Norm Austin and Mike Clary "Progress toward a total solution for mask shop data input", Proc. SPIE 12809, Bay Area Chrome Users Society Symposium 1985, 128090I (20 December 2023); https://doi.org/10.1117/12.3011904
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KEYWORDS
Displays

Computing systems

Inspection

Manufacturing

Yield improvement

Computer hardware

Image registration

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