Paper
11 April 2024 Pulsed laser deposition using high-power Nd:YAG laser source operating at its first harmonics: recent approaches and advances
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Abstract
We report on the progress of Pulsed Laser Deposition growth of thin films by using a high-power Nd:YAG laser source. We demonstrate that by using the fundamental wavelength at 1064 nm, the congruent ablation of a large number of materials can be successfully achieved. Even if the infra-red radiation of the fundamental harmonics of Nd:YAG lasers - corresponding to impinging photons with energy of about 1.16 eV - is unexpectedly proved to be also absorbed by insulating materials characterized by a large value of the band-gap (e.g. 3.0 eV for rutile TiO2). Combined investigation of structural properties by transmission electron microscopy and scanning electron microscopy provides evidence of the very high-quality thin films grown by Nd:YAG lasers with no trace of precipitates and droplets over a scale of tens of micrometers.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
S. K. Chaluvadi, S. Punathum Chalil, F. Mazzola, P. Rajak, P. Banerjee, D. Knez, R. Ciancio, G. Rossi, and P. Orgiani "Pulsed laser deposition using high-power Nd:YAG laser source operating at its first harmonics: recent approaches and advances", Proc. SPIE 12939, High-Power Laser Ablation VIII, 129390C (11 April 2024); https://doi.org/10.1117/12.3016178
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KEYWORDS
Nd:YAG lasers

Thin films

Excimer lasers

Scanning electron microscopy

Thin film growth

Transmission electron microscopy

Pulsed laser deposition

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