Manufacturing and metrology of 3D holographic structure nanopatterns in roll-to-roll fabrication

Barbara Groh; Kwon Sang Lee; Luis Arturo Aguirre; Michael Cullinan; Chih-Hao Chang

doi:10.1117/12.3010004

9 April 2024 Manufacturing and metrology of 3D holographic structure nanopatterns in roll-to-roll fabrication

Barbara Groh, Kwon Sang Lee, Luis Arturo Aguirre, Michael Cullinan, Chih-Hao Chang

Author Affiliations +

Proceedings Volume 12956, Novel Patterning Technologies 2024; 1295609 (2024) https://doi.org/10.1117/12.3010004
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Eliminating the need for multilayer alignment in nanoscale manufactured devices will streamline the lithography process and open up avenues for flexible substrate roll-to-roll (R2R) manufacturing. A system capable of single-exposure 3D holographic lithography with in-line metrology and real-time feedback will revolutionize micro and nano manufacturing. Work towards such developments are demonstrated to show promise in the field of nanopatterning.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Barbara Groh, Kwon Sang Lee, Luis Arturo Aguirre, Michael Cullinan, and Chih-Hao Chang "Manufacturing and metrology of 3D holographic structure nanopatterns in roll-to-roll fabrication", Proc. SPIE 12956, Novel Patterning Technologies 2024, 1295609 (9 April 2024); https://doi.org/10.1117/12.3010004

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