Fabrication process of flexibly patterned grating by interference lithography system with automated beam alignment module

K. Toyoda; Y. Nawaki; R. Yanoshita; S. Orihara; M. Wasamoto; K. Ota; K. Tsuruoka

doi:10.1117/12.3010691

9 April 2024 Fabrication process of flexibly patterned grating by interference lithography system with automated beam alignment module

K. Toyoda, Y. Nawaki, R. Yanoshita, S. Orihara, M. Wasamoto, K. Ota, K. Tsuruoka

Author Affiliations +

Proceedings Volume 12956, Novel Patterning Technologies 2024; 129560Q (2024) https://doi.org/10.1117/12.3010691
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

We report on a new developed interference lithography system that allows flexible design of the slant angle and pattern pitch of the diffraction grating. The system consists of two optical paths moving on an arc stage and another stage moving horizontally with precision, allowing the slant angle and pattern pitch to be controlled up to ±25 degrees and from 150 to 500nm, typically. In addition, this system is equipped with a fine stage for semiconductor lithography, diode-pumped solid-state lasers with wavelengths of 266nm and 355nm, and a high-resolution actuator to achieve 0.01nm pitch accuracy and high contrast exposure. Slant gratings with different angles and directions depending on their position on a wafer can be processed with this system. This presentation will also introduce various structures developed with this system and examples of their potential applications.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

K. Toyoda, Y. Nawaki, R. Yanoshita, S. Orihara, M. Wasamoto, K. Ota, and K. Tsuruoka "Fabrication process of flexibly patterned grating by interference lithography system with automated beam alignment module", Proc. SPIE 12956, Novel Patterning Technologies 2024, 129560Q (9 April 2024); https://doi.org/10.1117/12.3010691

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