This study introduces a groundbreaking approach to micro/nanoscale patterning by synergistically combining Two- Photon Polymerization (TPP) with Digital Micro Mirror Device (DMD) technology. By leveraging a femtosecond laser and employing a novel grayscale lithography method via the DMD, we have significantly optimized both the throughput and resolution of patterning processes beyond the traditional diffraction limit. Our methodology enables the precise fabrication of complex 3D nano-structures as well as intricate 2D patterns, addressing long-standing throughput and resolution challenges in TPP. Through simulations of the Point Spread Function (PSF) and meticulous adjustments to the DMD's grayscale modulation, we achieved uniform light intensity and high-resolution patterning, demonstrating the potential of this approach to revolutionize micro and nanoscale fabrication. The successful integration of DMD-enhanced femtosecond laser patterning with TPP opens new avenues for the development of advanced devices across various fields, from biomedical engineering to microelectronics, setting a new benchmark for precision and efficiency in digital patterning technologies.
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