Presentation + Paper
17 June 2024 Hyperpolished off-axis optics using nanoparticle slurries: concept and first results.
Author Affiliations +
Abstract
A new step was taken in the development of the Chemical-Mechanical mirror polishing (CMP) manufacturing process for so-called “hyper-polished” optics. The main objective was to explore the limits of hyper polishing with the synthesis of Silica oxide and Cerium oxide nanoparticle slurries. Better control of the size and morphology of the synthesized SiO2 and CeO2 nanoparticles in the slurries will give us information on the surface chemistry and the interaction that happens while polishing but it will also allow us to take a step forward to meet the challenge of reducing the surface roughness below the Angstrom.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Houda Bellahsene, Saad Sene, Michel Marcos, Manal Chebbo, Joulia Larionova, Yannick Guari, and Marc Ferrari "Hyperpolished off-axis optics using nanoparticle slurries: concept and first results.", Proc. SPIE 13021, Optical Fabrication and Testing VIII, 1302104 (17 June 2024); https://doi.org/10.1117/12.3022703
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KEYWORDS
Nanoparticles

Polishing

Adaptive optics

Surface roughness

Silica

Exoplanets

Planets

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