Presentation + Paper
2 October 2024 Heterogeneous integration of active photonic materials leveraging substrate-inverted multimaterial integration technology (SuMMIT)
Author Affiliations +
Abstract
Heterogeneous integration of new materials promises to significantly expand the range of capabilities accessible by silicon photonic integrated circuits (PICs). However, the classical integration protocols, which involves etching trenches through the backend-of-the-line (BEOL) layers to access the PIC for subsequent material bonding or deposition, face severe limitations in integration capacity, packaging density, and process complexity. Moreover, the inability to utilize the BEOL layers is a major missed opportunity for innovative 2.5-D photonic device designs. In this talk, we will unveil a new, universal heterogeneous integration platform: Substrate-inverted Multi-Material Integration Technology (SuMMIT). The SuMMIT integration scheme leverages advanced wafer-scale 3-D packaging technologies such as through-Si vias and direct bond interconnects to enable seamless integration of non-CMOS materials.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Luigi Ranno, Jia Xu Brian Sia, Khoi Phuong Dao, and Juejun Hu "Heterogeneous integration of active photonic materials leveraging substrate-inverted multimaterial integration technology (SuMMIT)", Proc. SPIE 13110, Active Photonic Platforms (APP) 2024, 131100A (2 October 2024); https://doi.org/10.1117/12.3025748
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KEYWORDS
Photonic integrated circuits

Back end of line

Semiconducting wafers

Silicon

Waveguides

Silicon photonics

Metals

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