A short wavelength light source for lithography using a regenerative liquid metal bismuth target

Tatsuya Soramoto; Ayaka Ogiwara; Tsukasa Sugiura; Hiroki Morita; Takeshi Higashiguchi

doi:10.1117/12.3032351

26 August 2024 A short wavelength light source for lithography using a regenerative liquid metal bismuth target

Tatsuya Soramoto, Ayaka Ogiwara, Tsukasa Sugiura, Hiroki Morita, Takeshi Higashiguchi

Proceedings Volume 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology; 1317714 (2024) https://doi.org/10.1117/12.3032351
Event: Photomask Japan 2024, 2024, Yokohama, Japan

Abstract

We demonstrated a water-window (WW) soft x-ray (SXR) source using a regenerative liquid bismuth target irradiated by a solid-state laser. A tank filled with the solid Bi particles was heated by a band heater to make liquid Bi, and then it was pushed out from the nozzle by the nitrogen gas. A 1064-nm Nd:YAG laser with a pulse duration of 150 ps and a repetition rate of 10 Hz was irradiated to the liquid Bi target. We observed the time-integrated spectrum of SXR with a wavelength shorter than 6 nm using a spectroscopy and energy spectrum of the suprathermal ions emitted from the WWSXR source using a Faraday cup. The number of photons was observed to be about 1 ×10¹³ photons/nm·sr·pulse at a peak wavelength of 3.9 and 4.2 nm, and 0.4 ×10¹³ photons/nm·sr·pulse at a peak wavelength of 2.4 nm. The total number of photons emitted in 2.3 – 4.4 nm was about 1×10¹³ photons/sr·pulse. Suprathermal ions were also emitted with a maximum energy of 140 keV from the hot, dense Bi plasma. These results have the potential to use a short wavelength light source for next-generation lithography systems.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Tatsuya Soramoto, Ayaka Ogiwara, Tsukasa Sugiura, Hiroki Morita, and Takeshi Higashiguchi "A short wavelength light source for lithography using a regenerative liquid metal bismuth target", Proc. SPIE 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology, 1317714 (26 August 2024); https://doi.org/10.1117/12.3032351

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