Wavefront analysis of photolithographic lenses for wavelengths of 300 to 600 nm

Wolfgang Freitag; W. Grossmann

doi:10.1117/12.34902

1 July 1990 Wavefront analysis of photolithographic lenses for wavelengths of 300 to 600 nm

Wolfgang Freitag, W. Grossmann

Proceedings Volume 1319, Optics in Complex Systems; (1990) https://doi.org/10.1117/12.34902
Event: 15th International Optics in Complex Systems, 1990, Garmisch, Germany

Abstract

The method of wavefront analysis is based on the metrological simulation of optical ray tracing. Many rays, selected by a pinhole, will be analysed sequentially, so that the transverse ray aberrations measured with a elekironic coordinate-detector can be stored in the computer. Due to low power per ray photon counting must be applied. The aberrations are necessary to start a mathematical analysis by the computer and the result is the wavefront from the lens under test for one point represented by the Niiboer-Zernike-coefficients. This method needs no addditional optics, so it is possible to measure with ligth of any wavelength especially with ultravioleti ligth, too.

Citation Download Citation

Wolfgang Freitag and W. Grossmann "Wavefront analysis of photolithographic lenses for wavelengths of 300 to 600 nm", Proc. SPIE 1319, Optics in Complex Systems, (1 July 1990); https://doi.org/10.1117/12.34902

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