Paper
1 March 1991 High-conducting p+-InGaAs toplayers produced by simultaneous diffusion of Zn and Cd
Bernd Gruska, P. Ambree, K. Wandel, U. Wielsch
Author Affiliations +
Abstract
Simultaneous diffusion of Zn and Cd yields shallow and high doped pt_InGaAs layers. Using a closed ampoule technique an increa sing amount of CdAs2 in the Cd3As2/Zn3As2 source results in a decrea sing diffusion depth whereas a high hole concentration level can be realised. The experimental result of the simultaneous penetration of Zn and Cd atoms into the crystal can be understood on the basis of an interstitialsubstitutional diffusion mechanism.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bernd Gruska, P. Ambree, K. Wandel, and U. Wielsch "High-conducting p+-InGaAs toplayers produced by simultaneous diffusion of Zn and Cd", Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); https://doi.org/10.1117/12.24439
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KEYWORDS
Diffusion

Zinc

Cadmium

Indium gallium arsenide

Chemical species

Optoelectronic devices

Arsenic

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