Paper
1 February 1991 Integrated optical channel waveguides in silicon using SiGe alloys
Armin O. Splett, Joachim Schmidtchen, Berndt Schueppert, Klaus Petermann
Author Affiliations +
Proceedings Volume 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications; (1991) https://doi.org/10.1117/12.24472
Event: Physical Concepts of Materials for Novel Optoelectronic Device Applications, 1990, Aachen, Germany
Abstract
Different techniques for fabrication of single-mode waveguides in silicon by etching and indiffusion are reported. Minimum propagation losses around 3dB/cm at a wavelength of 1. 3Lm have been achieved.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Armin O. Splett, Joachim Schmidtchen, Berndt Schueppert, and Klaus Petermann "Integrated optical channel waveguides in silicon using SiGe alloys", Proc. SPIE 1362, Physical Concepts of Materials for Novel Optoelectronic Device Applications II: Device Physics and Applications, (1 February 1991); https://doi.org/10.1117/12.24472
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Cited by 1 scholarly publication and 2 patents.
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KEYWORDS
Silicon

Waveguides

Germanium

Integrated optics

Optoelectronic devices

Diffusion

Physics

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