Primary research for mechanism of forming PLH

Lurong Guo; Xiao-Chun Zhang; Yongkang Guo

doi:10.1117/12.44813

1 July 1991 Primary research for mechanism of forming PLH

Lurong Guo, Xiao-Chun Zhang, Yongkang Guo

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44813
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

This paper presents the primary research mechanism of forming a photolithographic hologram (PLH), and emphatically points out that in the course of the etching process, the etch gases react with the photoresist (PR) and substrate under it simultaneously until the relief patterns on the PR have been transferred completely and PL comes out.

Citation Download Citation

Lurong Guo, Xiao-Chun Zhang, and Yongkang Guo "Primary research for mechanism of forming PLH", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44813

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