Characterization of anodic fluoride films on Hg1-xCdxTe

Ignacio Esquivias; M. Dal Colle; D. Brink; Jan W. Baars; Martin Bruder

doi:10.1117/12.46507

1 August 1991 Characterization of anodic fluoride films on Hg_1-xCd_xTe

Ignacio Esquivias, M. Dal Colle, D. Brink, Jan W. Baars, Martin Bruder

Proceedings Volume 1484, Growth and Characterization of Materials for Infrared Detectors and Nonlinear Optical Switches; (1991) https://doi.org/10.1117/12.46507
Event: Orlando '91, 1991, Orlando, FL, United States

Abstract

Experimental results concerning the properties of anodic fluoride films grown on HgCdTe (O.2 xO.3) are presented and discussed. The analysis of the growth rate and XPS measurements indicate that the films are composed of a mixture of Cd, Hg and Te fluorides, together with unreacted HgTe and elemental Te. The films are characterized by some of their optical, electrical and chemical properties. Capacitance—voltage measurements of MIS devices are employed to determine the electronic properties of the anodic fluoridelllgCdTe interface. The results show that a positive and unstable charge density is present at the interface.

Citation Download Citation

Ignacio Esquivias, M. Dal Colle, D. Brink, Jan W. Baars, and Martin Bruder "Characterization of anodic fluoride films on Hg_1-xCd_xTe", Proc. SPIE 1484, Growth and Characterization of Materials for Infrared Detectors and Nonlinear Optical Switches, (1 August 1991); https://doi.org/10.1117/12.46507

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