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This paper presents a review of the effects induced by ion implantation in silica glass and in SiO2 films on silicon with particular emphasis on optical modifications and new compound formation. The formation of silicon oxynitrides and nitrogen oxides in surface layers as a consequence of nitrogen implantation was investigated by using different techniques as XPS, SIMS, and optical methods.
Paolo Mazzoldi,Alberto Carnera,Frederico Caccavale,G. Granozzi,R. Bertoncello,Giancarlo Battaglin,A. Boscolo-Boscoletto, andPiero Polato
"Ion beam modification of glasses", Proc. SPIE 1513, Glasses for Optoelectronics II, (1 August 1991); https://doi.org/10.1117/12.46022
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Paolo Mazzoldi, Alberto Carnera, Frederico Caccavale, G. Granozzi, R. Bertoncello, Giancarlo Battaglin, A. Boscolo-Boscoletto, Piero Polato, "Ion beam modification of glasses," Proc. SPIE 1513, Glasses for Optoelectronics II, (1 August 1991); https://doi.org/10.1117/12.46022