Generation and laser diagnostic analysis of bismuth fluoride

Matthew J. Bohn; D. C. Berst; Ernest A. Dorko

doi:10.1117/12.58979

1 May 1992 Generation and laser diagnostic analysis of bismuth fluoride

Matthew J. Bohn, D. C. Berst, Ernest A. Dorko

Author Affiliations +

Proceedings Volume 1628, Intense Laser Beams; (1992) https://doi.org/10.1117/12.58979
Event: OE/LASE '92, 1992, Los Angeles, CA, United States

Abstract

Bismuth fluoride, BiF, a possible energy acceptor molecule in a chemically-pumped donor- acceptor electronic transition laser has been produced in a flow tube reactor. A high voltage discharge was used to produce bismuth and fluorine atoms which combined to form ground state BiF(X). Laser induced fluorescence studies confirmed that BiF was formed following the discharge. A vibrational temperature of 581 +/- 35 K was measured.

Citation Download Citation

Matthew J. Bohn, D. C. Berst, and Ernest A. Dorko "Generation and laser diagnostic analysis of bismuth fluoride", Proc. SPIE 1628, Intense Laser Beams, (1 May 1992); https://doi.org/10.1117/12.58979

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE