Single-level electric testsites for phase-shifting masks

Burn Jeng Lin; Donald J. Samuels; Chris A. Spence

doi:10.1117/12.59795

1 June 1992 Single-level electric testsites for phase-shifting masks

Burn Jeng Lin, Donald J. Samuels, Chris A. Spence

Proceedings Volume 1673, Integrated Circuit Metrology, Inspection, and Process Control VI; (1992) https://doi.org/10.1117/12.59795
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The phase shifting mask technology has quickly progressed from the exploratory phase to a serious development phase. This requires high resolution measurement techniques to quantify experimental results to optimize the designs. This paper describes a set of electrical linewidth measurement testsites which covers all five representative lithographic features in combination of dark-field and light-field patterns, positive and negative resists. The testsites can investigate binary intensity mask, attenuated, alternating, subresolution-assisted, rim, unattenuated, edge, and covered edge phase shifting masks. All testsites can be used with a single-level wafer exposure. There is no need to remove extra shorts or opens induced by uncovered phase shifters.

Citation Download Citation

Burn Jeng Lin, Donald J. Samuels, and Chris A. Spence "Single-level electric testsites for phase-shifting masks", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59795

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