High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser

Peter Lokai; Ulrich Rebhan; Uwe Stamm; Hermann Buecher; Hans-Juergen Kahlert; Dirk Basting

doi:10.1117/12.130371

1 June 1992 High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser

Peter Lokai, Ulrich Rebhan, Uwe Stamm, Hermann Buecher, Hans-Juergen Kahlert, Dirk Basting

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130371
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

The bandwidth requirements 1, 2, 3, 4, 5 on DUV 248 nm lithography laser sources, in general, are a function of a number of physical parameters. For example, the stepper lens, the image field size and the required resolution. The trend towards larger field sizes in new DUV-stepper lenses has resulted in a bandwidth need of below 2 ?m for a lorentzian spectral distribution.

Citation Download Citation

Peter Lokai, Ulrich Rebhan, Uwe Stamm, Hermann Buecher, Hans-Juergen Kahlert, and Dirk Basting "High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130371

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