Application-specific resist stripping with integrated processing in a single multiple-process chamber

Richard L. Bersin

doi:10.1117/12.142930

16 April 1993 Application-specific resist stripping with integrated processing in a single multiple-process chamber

Richard L. Bersin

Proceedings Volume 1803, Advanced Techniques for Integrated Circuit Processing II; (1993) https://doi.org/10.1117/12.142930
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States

Abstract

A multi-process chamber has been developed for ashing of photoresist. Using microwave downstream and RIE processing, ashing processes have been developed which result in residues soluble in DI water, bypassing the need for solvent or acid treatment.

Citation Download Citation

Richard L. Bersin "Application-specific resist stripping with integrated processing in a single multiple-process chamber", Proc. SPIE 1803, Advanced Techniques for Integrated Circuit Processing II, (16 April 1993); https://doi.org/10.1117/12.142930

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