Paper
16 March 1993 Patterned Schottky barrier solar cells
Haim Grebel, K. J. Fang, C. Manolis
Author Affiliations +
Proceedings Volume 1804, Rapid Thermal and Laser Processing; (1993) https://doi.org/10.1117/12.142083
Event: Microelectronic Processing '92, 1992, San Jose, CA, United States
Abstract
Easy to make, potentially high efficient Schottky type solar cells are presented. Patterning of the cells of Si wafers was achieved by photo-ablation using a UV Excimer laser. We have found that the patterned cells were as much as 15% more efficient than non-patterned cells.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Haim Grebel, K. J. Fang, and C. Manolis "Patterned Schottky barrier solar cells", Proc. SPIE 1804, Rapid Thermal and Laser Processing, (16 March 1993); https://doi.org/10.1117/12.142083
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KEYWORDS
Solar cells

Optical lithography

Silicon

Excimer lasers

Ultraviolet radiation

Laser processing

Semiconducting wafers

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