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The status of x-ray mask inspection and repair at the IBM Advanced Mask Facility is presented. Defect classification and sources are presented along with some preliminary results from a defect printing study done at the Advanced Lithography Facility.
Steven C. Nash,James P. Levin, andO. De Hodgins
"Status of x-ray mask inspection and repair", Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142140
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Steven C. Nash, James P. Levin, O. De Hodgins, "Status of x-ray mask inspection and repair," Proc. SPIE 1809, 12th Annual BACUS Symposium on Photomask Technology and Management, (26 March 1993); https://doi.org/10.1117/12.142140