Generation and amplification of subpicosecond ArF radiation

Thomas Hofmann; Kasem Mossavi; Gabor Szabo; Frank K. Tittel

doi:10.1117/12.144673

4 May 1993 Generation and amplification of subpicosecond ArF radiation

Thomas Hofmann, Kasem Mossavi, Gabor Szabo, Frank K. Tittel

Proceedings Volume 1810, 9th International Symposium on Gas Flow and Chemical Lasers; (1993) https://doi.org/10.1117/12.144673
Event: Ninth International Symposium on Gas Flow and Chemical Lasers, 1992, Heraklion, Greece

Abstract

A dispersively compensated scheme for sum-frequency mixing has been developed to generate subpicosecond injection pulses at 193 nm for subsequent amplification in ArF excimer amplifier modules. Such a scheme is capable of generating 12 (mu) J at 193 nm with a spectral bandwidth of 0.22 nm corresponding to 250 fs pulse duration by mixing short pulse radiation at 266 nm and 707 nm in a 1 mm BBO crystal. This VUV source has been used to characterize the small-signal gain and the saturation energy density of a discharge pumped ArF excimer amplifier.

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Thomas Hofmann, Kasem Mossavi, Gabor Szabo, and Frank K. Tittel "Generation and amplification of subpicosecond ArF radiation", Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); https://doi.org/10.1117/12.144673

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