Optical degradation issues for XUV projection lithography systems

Brian Emerson Newnam

doi:10.1117/12.147391

24 June 1993 Optical degradation issues for XUV projection lithography systems

Brian Emerson Newnam

Proceedings Volume 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992; (1993) https://doi.org/10.1117/12.147391
Event: Optical Materials for High Power Lasers, 1992, Boulder, CO, United States

Abstract

We review the degradation susceptibility of the various optical components proposed for use in XUV projection lithography systems at 13 - 20 nm. Contamination by laser plasma target debris and carbonaceous films are two primary hazards that must be essentially nullified. Pertinent experimental results of a number of researchers illustrate the present status.

Citation Download Citation

Brian Emerson Newnam "Optical degradation issues for XUV projection lithography systems", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147391

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