Influence of process parameters on the lithographic performance characterization in the top imaging process by silylation

Tai-Kyung Won; Seung-Chan Moon; Hyeong-Soo Kim; Jin-Woong Kim; Myung-Seon Kim; Dong-Jun Ahn; Soo-Han Choi

doi:10.1117/12.154804

15 September 1993 Influence of process parameters on the lithographic performance characterization in the top imaging process by silylation

Tai-Kyung Won, Seung-Chan Moon, Hyeong-Soo Kim, Jin-Woong Kim, Myung-Seon Kim, Dong-Jun Ahn, Soo-Han Choi

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Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154804
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

Single level dry developable resist process based on gas phase silylation has great promise for sub-halfmicron pattern imaging due to shallow exposure, which leads to a thin silicon incorporation layer during silylation process in the top exposed region. In this paper the influence of process key parameters on the lithographic performance characterization has been investigated. For this experiment, two kinds of commercial i-line photoresists based upon novolac-diazoquinone and tetramethyldisilazane as a silylation agent were used for analyzing the process properties. As a result, it was observed that the ultimate resolution of 0.30 micrometers with vertical profiles, projected with an i-line of 0.54 NA lens, was obtained. However, it was found that CD linearity characteristics strongly depend on the compositions and the structure of photoresist, independent of other process parameters. Selectivity of dry development with a range of 13 - 15 was achieved using the oxygen/argon mixtures at 5 mTorr with MERIE. Major factors affect on the resist pattern profile were proven to be dry development parameters as well as the latent image formation of silylation. In particular, lower power and higher magnetic field conditions at low pressure allowed a good resist pattern profile without sidewall roughness and residues. And effects of silylation parameters on process latitudes has also been studied by comparing resolution capability, DOF, and exposure latitude, respectively.

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Tai-Kyung Won, Seung-Chan Moon, Hyeong-Soo Kim, Jin-Woong Kim, Myung-Seon Kim, Dong-Jun Ahn, and Soo-Han Choi "Influence of process parameters on the lithographic performance characterization in the top imaging process by silylation", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154804

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KEYWORDS

Photoresist processing

Image processing

Lithography

Photoresist materials

Diffusion

Magnetism

Photoresist developing

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