Laser and pinch plasma x-ray sources for microscopy and lithography

Willi Neff; D. Rothweiler; Klaus Eidmann; Rainer Lebert; Franz Richter; G. Winhart

doi:10.1117/12.167990

1 February 1994 Laser and pinch plasma x-ray sources for microscopy and lithography

Willi Neff, D. Rothweiler, Klaus Eidmann, Rainer Lebert, Franz Richter, G. Winhart

Proceedings Volume 2015, Applications of Laser Plasma Radiation; (1994) https://doi.org/10.1117/12.167990
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Experimental results on radiative properties of laser produced and pinch plasmas are discussed in comparison and with respect to the specific sets of requirements defined by proximity printing x-ray lithography and full field imaging x-ray microscopy.

Citation Download Citation

Willi Neff, D. Rothweiler, Klaus Eidmann, Rainer Lebert, Franz Richter, and G. Winhart "Laser and pinch plasma x-ray sources for microscopy and lithography", Proc. SPIE 2015, Applications of Laser Plasma Radiation, (1 February 1994); https://doi.org/10.1117/12.167990

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