Paper
5 January 1994 X-ray conversion efficiency in short-pulse laser plasmas
Jean-Francois Pelletier, Mohamed Chaker, Yves Beaudoin, Christian Y. Cote, Jean-Claude Kieffer
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Abstract
We present a comparative study of the x-ray emission produced by laser plasma sources in short ((tau) L equals 0.6 ps) and long ((tau) L equals 0.6 ns) pulse regimes for copper and tantalum targets. The experiments at (tau) L equals 0.6 ps show that the x-ray conversion efficiency (eta) is still increasing with laser intensity between 2 X 1015 W/cm2 and 5 X 1016 W/cm2 for both sub-keV (0.1 - 0.75 keV) and keV (0.75 - 2 keV) ranges. In addition, we found that the optimum values (eta) at (tau) L equals 0.6 ps are at least 2 - 4 times lower than those at (tau) L equals 0.6 ns.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean-Francois Pelletier, Mohamed Chaker, Yves Beaudoin, Christian Y. Cote, and Jean-Claude Kieffer "X-ray conversion efficiency in short-pulse laser plasmas", Proc. SPIE 2041, Mode-locked and Other Ultrashort Laser Designs, Amplifiers, and Applications, (5 January 1994); https://doi.org/10.1117/12.165616
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Cited by 2 scholarly publications.
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KEYWORDS
X-rays

Picosecond phenomena

Tantalum

Copper

Pulsed laser operation

Plasma

Diodes

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