Flexure of photomasks in manufacturing and application

Michael Zander

doi:10.1117/12.167285

15 February 1994 Flexure of photomasks in manufacturing and application

Michael Zander

Proceedings Volume 2087, 13th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.167285
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

The actual photomask surface formation during all relevant stages of manufacturing and application generally is determined by substrate flatness, stress introduced by the coating layers and, in particular, by gravity bending determined by substrate dimensions and actual clamping configuration. Dependant on the source of surface deformation, the actual pattern positions may vary in different ways compared to the design and lead to a registration error of up to 0.1 micrometers . Approaching these problems from the mask metrology point of view this paper presents a study based on modelling and experimental verification utilizing the Z- mapping feature of Nikon XY 3I mask metrology tool. The two error types, cosine error and pattern shift by lateral surface compression or stretching, will be calculated for two basic clamping configurations. Derived from the results and under consideration of current flexure compensation schemes the impact on the printed wafer image will be estimated leading to a discussion of possible correction schemes.

Citation Download Citation

Michael Zander "Flexure of photomasks in manufacturing and application", Proc. SPIE 2087, 13th Annual BACUS Symposium on Photomask Technology and Management, (15 February 1994); https://doi.org/10.1117/12.167285

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