UV laser patterning of polymers: in-situ and nondestructive evaluation of incubation phenomena by photothermal techniques

Zhouling Wu; Eckart Matthias; S. S. Xue; Y. Zhang

doi:10.1117/12.180917

28 July 1994 UV laser patterning of polymers: in-situ and nondestructive evaluation of incubation phenomena by photothermal techniques

Zhouling Wu, Eckart Matthias, S. S. Xue, Y. Zhang

Author Affiliations +

Proceedings Volume 2114, Laser-Induced Damage in Optical Materials: 1993; (1994) https://doi.org/10.1117/12.180917
Event: Laser-Induced Damage in Optical Materials: 1993, 1993, Boulder, CO, United States

Abstract

The optical absorption coefficient of some polymer materials can be increased by exposure to low fluence UV laser radiation. This phenomenon, known as UV light incubation, has been demonstrated to be a powerful tool for surface patterning of organic polymers. In this paper we report our recent progress in understanding the incubation phenomenon and its application to laser patterning by using various photothermal techniques. The data reported include the in- situ monitored incubation/ablation dynamics and the absolute change in optical absorption and thermal diffusivity of the incubated area. Besides these nondestructive evaluation experiments, some of the incubated sites are exposed to high fluence laser radiation. The results show that fine structures with submicron spatial resolution can be achieved without the necessity to focus tightly the ablation laser beam.

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Zhouling Wu, Eckart Matthias, S. S. Xue, and Y. Zhang "UV laser patterning of polymers: in-situ and nondestructive evaluation of incubation phenomena by photothermal techniques", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180917

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