Laser-focused atomic deposition

Jabez J. McClelland; R. E. Scholten; Rajeev Gupta; Robert J. Celotta

doi:10.1117/12.180858

21 July 1994 Laser-focused atomic deposition

Jabez J. McClelland, R. E. Scholten, Rajeev Gupta, Robert J. Celotta

Proceedings Volume 2125, Laser Techniques for Surface Science; (1994) https://doi.org/10.1117/12.180858
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

We have demonstrated the use of a standing-wave laser beam to focus chromium atoms as they deposit onto a silicon surface. A permanent array of Cr lines has been fabricated, with line width 65 nm, spacing 213 nm, and height 34 nm. The array covers an area of 0.4 mm X 1 mm, and was deposited in approximately 10 minutes. The lines made in this way constitute a proof-of- principle of an entirely new approach to nanostructure fabrication, with potential for extremely small feature size coupled with massive parallelism.

Citation Download Citation

Jabez J. McClelland, R. E. Scholten, Rajeev Gupta, and Robert J. Celotta "Laser-focused atomic deposition", Proc. SPIE 2125, Laser Techniques for Surface Science, (21 July 1994); https://doi.org/10.1117/12.180858

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