Enhanced quantum well intermixing using multiple ion implantation

Philip J. Poole; Paul Garrett Piva; Margaret Buchanan; Garth Champion; Ian M. Templeton; Geof C. Aers; Robin L. Williams; Alain P. Roth; Zbigniew R. Wasilewski; Emil S. Koteles; N. Sylvain Charbonneau; Jacques Beauvais

doi:10.1117/12.175702

11 May 1994 Enhanced quantum well intermixing using multiple ion implantation

Philip J. Poole, Paul Garrett Piva, Margaret Buchanan, Garth Champion, Ian M. Templeton, Geof C. Aers, Robin L. Williams, Alain P. Roth, Zbigniew R. Wasilewski, Emil S. Koteles, N. Sylvain Charbonneau, Jacques Beauvais

Author Affiliations +

Proceedings Volume 2139, Quantum Well and Superlattice Physics V; (1994) https://doi.org/10.1117/12.175702
Event: OE/LASE '94, 1994, Los Angeles, CA, United States

Abstract

Quantum well intermixing has been performed using ion implantation techniques to increase the optical bandgap in a spatially selective manner. We show that there is a maximum single dose beyond which further intermixing of the QWs is impeded by damage to the semiconductor surface. We overcome this problem by using a series of implants and rapid thermal anneals, with each rapid thermal anneal repairing the crystal surface. Using this technique we have demonstrated shifts in optical bandgap for multiple implants greater than seven times that observed for a single implant.

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Philip J. Poole, Paul Garrett Piva, Margaret Buchanan, Garth Champion, Ian M. Templeton, Geof C. Aers, Robin L. Williams, Alain P. Roth, Zbigniew R. Wasilewski, Emil S. Koteles, N. Sylvain Charbonneau, and Jacques Beauvais "Enhanced quantum well intermixing using multiple ion implantation", Proc. SPIE 2139, Quantum Well and Superlattice Physics V, (11 May 1994); https://doi.org/10.1117/12.175702

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