Influence of retained and absorbed solvent on novolak and resist film dissolution and thermal behavior

Bernard T. Beauchemin Jr.; Charles E. Ebersole; Ivan S. Daraktchiev

doi:10.1117/12.175374

16 May 1994 Influence of retained and absorbed solvent on novolak- and resist- film dissolution and thermal behavior

Bernard T. Beauchemin Jr., Charles E. Ebersole, Ivan S. Daraktchiev

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175374
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Solvent evaporation from Novolak solution was characterized by TGA and occurs in two distinct stages of solvent loss: an evaporation limiting state (solvent determined) and a diffusion limiting stage (polymer determined) and is used to understand solvent retention mechanism during spin coating. Retained solvent content in Novolak films, as determined by gas chromatography and FT-IR Spectrometry, is found to reduce the apparent Tg and increase the bulk dissolution rate of the novolak. Solvent distribution in the film, monitored as a function of depth by a reflectance FT-IR technique, is used to develop a Novolak dissolution model which characterizes both surface induction and bulk dissolution behavior.

Citation Download Citation

Bernard T. Beauchemin Jr., Charles E. Ebersole, and Ivan S. Daraktchiev "Influence of retained and absorbed solvent on novolak- and resist- film dissolution and thermal behavior", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175374

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