Synthesis and patterning of 2-10 nanometer pinhole-free organic films

Sucheta Gorwadkar; G. K. Vinogradov; K. Senda; Ryoichi Inanami; C. Shao; Shinzo Morita

doi:10.1117/12.175397

16 May 1994 Synthesis and patterning of 2 to 10-nm pinhole-free organic films

Sucheta Gorwadkar, G. K. Vinogradov, K. Senda, Ryoichi Inanami, C. Shao, Shinzo Morita

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175397
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Ultrathin films in the thickness range of 2-10 nm were deposited by plasma polymerization. An AFM (atomic force microscope) was used to evaluate the film surface uniformity. The measured surface roughness of these films is of the order of 0.1 to 0.3 nm. It suggests that uniformly smooth, pinhole free ultra thin film organic films suitable for electronic applications can be deposited by plasma polymerization. The deposited films were tested for nanometer scale patterning using an atomic force microscope. Process of contact electrification was used to deposit local electric charge on these surface enhanced reactions with some adsorbates thus creating patterns.

Citation Download Citation

Sucheta Gorwadkar, G. K. Vinogradov, K. Senda, Ryoichi Inanami, C. Shao, and Shinzo Morita "Synthesis and patterning of 2 to 10-nm pinhole-free organic films", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175397

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