Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings

Yong-Ho Oh; Byung-Sun Park; Hai Bin Chung; Sang-Soo Choi; Seong-Hak Choi; Hyung Joun Yoo; Sin-Chong Park

doi:10.1117/12.175415

17 May 1994 Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings

Yong-Ho Oh, Byung-Sun Park, Hai Bin Chung, Sang-Soo Choi, Seong-Hak Choi, Hyung Joun Yoo, Sin-Chong Park

Proceedings Volume 2197, Optical/Laser Microlithography VII; (1994) https://doi.org/10.1117/12.175415
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

Some solutions are suggested for problems in the application of the dummy diffraction mask with the L/S phases grating. The degradation of the isolated pattern resolution can be successfully improved by the sub-resolution type design and the orientation dependency is attended by the zone by zone optimization technique with reduced gap size (approximately 200 micrometers ) between the main and dummy layers.

Citation Download Citation

Yong-Ho Oh, Byung-Sun Park, Hai Bin Chung, Sang-Soo Choi, Seong-Hak Choi, Hyung Joun Yoo, and Sin-Chong Park "Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings", Proc. SPIE 2197, Optical/Laser Microlithography VII, (17 May 1994); https://doi.org/10.1117/12.175415

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